Archive for the ‘IC’ Category

Monday, April 13th, 2009

Intermolecular, the combinatorial R&D company that has been working on semiconductor fab processes, plans to grow solar R&D to possibly be the largest portion of the company’s business. Under the leadership of new vice president and general manager of solar business group Craig Hunter (who joined from Applied Materials), Intermolecular is now working on both […]

Friday, April 10th, 2009

The Materials Research Society (MRS) Bulletin for April 2009 covers some of the newest engineering work for the growth of large and pure electronic crystals. In this week before the annual MRS Spring Meeting in San Francisco, this issue of the monthly MRS members magazine provides an excellent overview of the latest technologies used to […]

Thursday, April 9th, 2009

On April 7, 2009, KLA-Tencor introduced the TeraScanXR, the latest version of their TeraScan reticle inspection system, this one intended for 32nm node DUV masks. This new tool, an extension of existing reticle inspection systems, is designed to provide mask manufacturers better sensitivity, lower cost-per-inspection and faster mask dispositioning. Improvements in overall sensitivity in die-to-die […]

Wednesday, April 8th, 2009

IMEC has begun expanding its beautiful Leuven, Belgium campus facilities, starting with 2,800 square-meters of research labs and including the extension of its state-of-the-art clean room. With this extension, IMEC will expand its research on 22nm CMOS and beyond, low-cost and high-efficiency solar cells, and biomedical electronics. The Flemish Government invests 35 million euro and […]

Tuesday, April 7th, 2009

Semiconductor Equipment and Materials International (SEMI) collects and reports market size information for key sectors of the semiconductor ecosystem. It recently issued figures for the materials market, which in 2008 totaled $42.7 billion, essentially flat with the prior year. According to SEMI, rapidly slowing economic conditions in the fourth quarter squelched prospects for year-over-year growth […]

Monday, April 6th, 2009

Applied Materials and Disco announced a joint effort to develop wafer thinning processes for fabricating through-silicon vias (TSV) for future 3D IC stacks. The two companies, world leaders in thin-films and thinning (respectively) for silicon wafers, will be working together to develop integrated, high-performance process flows intended to lower the cost, reduce the risk and […]

Friday, April 3rd, 2009

The SPIE Europe Microtechnologies For the New Millennium congress has new partners this year, with the involvement of GMM, the Society of Microelectronics, Micro and Precision Engineering and the magazine mst|news as Cooperating Organisations for the first time. The event will be held at the Congress Centre Maritim Hotel in Dresden, Germany, 4-6 May 2009. […]

Thursday, April 2nd, 2009

The control of complex interdependencies is critical for the successful manufacturing of nanometer-scale ICs. Every aspect of every unit process step in the line must be ever more tightly controlled to ensure that 45nm and 32nm node chips can be made with good yield. To serve the market, Novellus continues to announce new integrated surface-treatment […]

Wednesday, April 1st, 2009

Asahi Glass is promoting a family of new photosensitive spin-on-dielectric (SOD) films for fan-out WLP and 3D packages, as well as for FPD and MEMS applications. The Chemicals Fluoroproducts Division of Asahi Glass has successfully developed the AL-X polymer series, primarily targeting the redistribution/rewiring layers in fan-out WLP packages. The company will begin production of […]

Tuesday, March 31st, 2009

Semilab, founded in 1990 and headquartered in Budapest, Hungary, is spending cash to continue to expand its portfolio of fab metrology offerings. Today, the company announced it has acquired Advanced Metrology Systems (AMS) and QC Solutions. The two Massachusetts-based metrology companies expand Semilab’s family of scalable, flexible solutions to help semiconductor and solar manufacturers characterize […]