Thursday, April 22nd, 2010
HP Labs in Palo Alto has been leading the development of the “memristor,” and researchers there have finally discovered the underlying mechanism for the formation of devices that can function as memory cells, logic circuits, and potentially even real artificial intelligence (AI)! Disclosing these results in his plenary speech to the attendees at the Nanocontacts […]
Memristor manufacturing for memory, logic, and AI
Tags: 16nm, 22nm, AI, logic, materials, memory, memristor, nano, R&D, ReRAM
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Monday, April 5th, 2010
The 2010 SPIE Advanced Lithography conference is where we first get glimpses of the future of nano-scale patterning technology for manufacturing. Sometimes, many fuzzy blobs come into focus as a picture in a single moment, and Yan Borodovsky of Intel showed how to do 22nm node litho the day before SPIE officially started. At both […]
Litho limit seen as 1D patterns
Tags: 22nm, DSA, EbDW, EUV, HDD, HVM, litho, NGL, NIL
Posted in Equipment, fab, IC, Material, MEMS | Comments Off on Litho limit seen as 1D patterns