Posts Tagged ‘IC’
Friday, April 3rd, 2009
The SPIE Europe Microtechnologies For the New Millennium congress has new partners this year, with the involvement of GMM, the Society of Microelectronics, Micro and Precision Engineering and the magazine mst|news as Cooperating Organisations for the first time. The event will be held at the Congress Centre Maritim Hotel in Dresden, Germany, 4-6 May 2009. […]
SPIE Europe Microtechnologies congress 2009
Tags: 32nm, 45nm, 65nm, DRAM, IC, MEMS, PV, SPIE
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Thursday, April 2nd, 2009
The control of complex interdependencies is critical for the successful manufacturing of nanometer-scale ICs. Every aspect of every unit process step in the line must be ever more tightly controlled to ensure that 45nm and 32nm node chips can be made with good yield. To serve the market, Novellus continues to announce new integrated surface-treatment […]
Novellus 32nm dielectric barriers
Tags: 32nm, 45nm, 65nm, barrier, CVD, IC, low-k, PECVD, SiCN
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Wednesday, April 1st, 2009
Asahi Glass is promoting a family of new photosensitive spin-on-dielectric (SOD) films for fan-out WLP and 3D packages, as well as for FPD and MEMS applications. The Chemicals Fluoroproducts Division of Asahi Glass has successfully developed the AL-X polymer series, primarily targeting the redistribution/rewiring layers in fan-out WLP packages. The company will begin production of […]
Asahi Glass photo-SOD
Tags: 3D, FPD, IC, litho, low-k, Material, MEMS, package, photo-SOD, SOD, spin-on, WLP
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Tuesday, March 31st, 2009
Semilab, founded in 1990 and headquartered in Budapest, Hungary, is spending cash to continue to expand its portfolio of fab metrology offerings. Today, the company announced it has acquired Advanced Metrology Systems (AMS) and QC Solutions. The two Massachusetts-based metrology companies expand Semilab’s family of scalable, flexible solutions to help semiconductor and solar manufacturers characterize […]
Semilab acquires AMS and QC Solutions companies
Tags: 45nm, epi, fab, high-k, IC, implant, Material, metal, metrology, PV, solar, test, thin-film
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Thursday, March 26th, 2009
German and French teams are combining EUR 14.5m investment into development of strained-silicon on insulator (sSOI) technology under the DEvice and CIrcuit performance boosted through SIlicon material Fabrication (DECISIF) program. The work will combine original research results from Research Center Juelich and Leti/Soitec to try to lower costs and defect-densities in the creation of 300mm […]
DECISIF start on strained silicon
Tags: 22nm, 32nm, 45nm, CVD, EDA, epi, IC, implant, integration, Material, Si, SiGe, SOI, sSOI, strain, wafer
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Wednesday, March 25th, 2009
Novaled, the provider of Organic Light Emitting Diode (OLED) technology and materials, and Holst Centre, an independent R&D centre developing generic technologies for Wireless Autonomous Transducer Solutions and for Systems-in-Foil, have decided to collaborate on the development of organic thin film transistor (OTFT) technologies under a joint development agreement. Novaled will provide its organic dopants […]
Novaled and Holst Centre JDA on OTFT
Tags: CMOS, dopant, IC, Material, OLED, organic, OTFT, TFT
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Monday, March 23rd, 2009
Keithley Instruments has been very busy extending the capabilities of it’s 4200-SCS (Semiconductor Characterization System) with new cables for IC measurements and new software libraries for PV, OLED, and other devices. The 4200-SCS replaces a variety of electrical test tools with a single integrated characterization solution, and works for applications including semiconductor technology development, process […]
Keithley 4200-SCS upgrades
Tags: C-V, characterization, FPD, I-V, IC, OLED, prober, PV, Semiconductor, test
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Friday, March 20th, 2009
Novellus’ applications labs have been working on CVD low-k dielectrics targeting 32nm node multilevel metal specs, and the result is “dense” ultra-low-k (ULK) film with bulk k=2.5 and the potential to go lower. Combined with the company’s multi-station sequential processing (MSSP) tool architecture for the barrier/cap depositions and UV/thermal cure steps, the result is a […]
Novellus low-k integration ideas
Tags: 32nm, 45nm, cure, CVD, IC, low-k, MPS, PLK, ULK, UV
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Thursday, March 19th, 2009
Mentor Graphics has announced new capabilities to the Calibre(R) platform to allow designers to control thickness variability due to Chemical Mechanical Planarization (CMP) at advanced process nodes. Designers can transition from dummy fill to density-based fill, or to full model-based fill, depending on the demands of their designs and target manufacturing process. The new capability […]
Mentor 3D solves CMP variation
Tags: 45nm, 65nm, CMP, EDA, fill, IC, metal, model, variation
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Wednesday, March 18th, 2009
Wright Williams & Kelly (WWK), the cost and productivity modeling company, is now providing free general information in an electronic newsletter, and has lowered the cost to start using it’s flagship TWO COOL(R) cost of ownership (CoO) modeling software. The company’s “Applied Cost Modeling” newsletter features free excerpts from the book “Hi-Tech Equipment Reliability: A […]
WWK cost modeling tools
Tags: CoO, fab, FPD, IC, MEMS, model, OEE, PV
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