Posts Tagged ‘IC’
Friday, February 20th, 2009
As computational lithography has become big big business, the pioneering enterprises have been assimilated into larger organizations (KLA-Tencor for Finle and Synopsys for Sigma-C, to name two examples). Panoramic Technology, however, continues its independence, supplying trustworthy and up-to-date simulators to advanced lithographers for a decade. Past Panoramic products, however, employed an interface that was familiar […]
Independent computational lithography simulator
Tags: DUV, EUV, i193, IC, litho, model, OPC
Posted in fab, IC, Product, Service | Comments Off on Independent computational lithography simulator
Thursday, February 19th, 2009
JSR announced today that it has entered into several joint development partnerships (JDP) with IBM to develop low-k dielectrics for 32nm and 22nm nodes of semiconductor technology. The companies will work on next generation materials JSR has had in development and commercial production, including low-k dielectrics and a broad range of photoresists. “This larger scale […]
JSR and IBM low-k JDPs for 32/22nm
Tags: 32nm, Cu, CVD, IC, litho, low-k, porous, resist, spin-on, ULK
Posted in fab, IC, Material, Product | Comments Off on JSR and IBM low-k JDPs for 32/22nm
Wednesday, February 18th, 2009
For thick plating applications like copper pillar bump processing in semiconductor advanced packaging, Shin-Etsu MicroSi has introduced a positive tone, ultra-thick photoresist, SIPR-7126. The 7100 chemically amplified (CA) series has been in production for several years, and the SIPR-7126 has been optimized to reduce processing steps and improve removability in layers up to 100 µm […]
Shin-Etsu positive i-line resist 100 microns thick
Tags: bump, CA, i-line, IC, litho, resist, TMAH, TSV
Posted in fab, IC, Material, MEMS, Product | Comments Off on Shin-Etsu positive i-line resist 100 microns thick
Tuesday, February 17th, 2009
Metrosol has joined SEMATECH’s Front End Process Technologies Program at the College of Nanoscale Science and Engineering (CNSE) of the University at Albany to address metrology and data-analysis solutions for 45nm node and beyond IC fabs. The joint partnership will expand on current work to develop inline metrology techniques to monitor the thickness and composition […]
Metrosol joins SEMATECH for HKMG R&D at CNSE
Tags: 45nm, fab, high-k, HK, IC, metrology, MG, R&D
Posted in Equipment, fab, IC, Product | Comments Off on Metrosol joins SEMATECH for HKMG R&D at CNSE
Friday, February 13th, 2009
Evident Technologies has announced the issuance of US Patent No. 7,482,059 covering the ability to synthesize a quantum dot with a metal layer which dramatically enhances the brightness and stability of a semiconductor nanocrystal complex. This advance of semiconductor materials science relies on a relatively low-cost colloidal formation processing, instead of needing epitaxial lattice-matching or […]
Evident quantum dot fab IP
Tags: CIGS, dot, IC, III-V, IP, LED, patent, quantum
Posted in fab, IC, Material, Product, PV | Comments Off on Evident quantum dot fab IP
Wednesday, February 11th, 2009
At Levitronix’s Ultrapure Fluid Handling and Wafer Cleaning Conference on February 11th, Particle Measuring Systems reviewed the limits of being able to detect things we do not want to find in flowing fluids, as enabled by a new digital detector array they call NanoVision Technology. Steven Verhaverbeke, tool design expert for Applied Materials who presented […]
Plenty of pixels size particles
Tags: 45nm, analysis, control, IC, ITRS, metrology, particle, spec
Posted in Equipment, fab, IC, MEMS, Product | Comments Off on Plenty of pixels size particles
Tuesday, February 10th, 2009
CMP applications experts gathered in Santa Clara, California on February 10th to share their experience and expertise at the fifth annual seminar sponsored by Levitronix. Leading developers, manufacturers, and end-users of CMP discussed all aspects of the technology, and since Levitronix makes magnetic levitation (MagLev) pumps there were many thorough presentations on slurry distribution issues. […]
Levitronix seminar shows how to do CMP
Tags: analysis, CMP, fab, IC, metrology, slurry, yield
Posted in Equipment, fab, IC, Material, Product | Comments Off on Levitronix seminar shows how to do CMP
Monday, February 9th, 2009
Toshiba claims the prototype of a new Ferroelectric Random Access Memory (FRAM) cell sized at 15F2 acheives read and write speed of 1.6-GB/s using a 130nm node CMOS process. The company will show details of this high bandwidth 128Mb non-volative RAM technology at the International Solid-State Circuits Conference 2009 (ISSCC 2009; Session 27.5) in San […]
Toshiba 128Mb FRAM using 15F2 cell
Tags: ALD, CMOS, FRAM, IC, memory, MOCVD, non-volatile
Posted in Equipment, fab, IC | Comments Off on Toshiba 128Mb FRAM using 15F2 cell
Thursday, February 5th, 2009
Microbridge Technologies, the inventor of passive, analog, MEMS-based precision IC calibration products known as rejustors, announced it has successfully closed an internal round of funding to build out a new presssure sensor family of chips. “The company will launch a line of Micro-Flow pressure sensors that achieve new levels of performance for a wide range […]
Microbridge pressure sensor family funded
Tags: CMOS, foundry, funding, IC, integrated, MEMS, pressure, sensor
Posted in fab, IC, MEMS, Product | Comments Off on Microbridge pressure sensor family funded
Wednesday, February 4th, 2009
Allvia, the first through-silicon via (TSV) foundry, has secured $5 million from private investors in a round of funding to expand manufacturing facilities and to build more capacity. After 3 years of revenue generation from providing vertical interconnects and System-in-Package (SiP) solutions, total investment in the company is now $25 million. With in-house processing equipment, […]
Allvia TSV foundry adding capacity
Tags: 3D, foundry, IC, interconnect, MEMS, package, RF, Service, Si, TSV
Posted in fab, IC, MEMS, Product, Service | Comments Off on Allvia TSV foundry adding capacity