While EUV Lithography may now be inevitable, according to SEMATECH Program Manager Bryan Rice, it may not be indispensable. SEMICON West offered a snapshot of progress towards the 32nm, 22nm, and 16nm device nodes at the Device Scaling TechXPOT, and the industry appears to have patterning options even if EUV encounters further delay. Yan Borodovsky […]

At Levitronix’s Ultrapure Fluid Handling and Wafer Cleaning Conference on February 11th, Particle Measuring Systems reviewed the limits of being able to detect things we do not want to find in flowing fluids, as enabled by a new digital detector array they call NanoVision Technology. Steven Verhaverbeke, tool design expert for Applied Materials who presented […]