Tuesday, April 5th, 2011
Prof. Masato Shibuya was awarded the JSAP Takuma Award 2011 for invention of the phase-shift mask (PSM) and opening the field of advanced lithography, as reported by independent PSM inventor Marc Levenson.
JSAP 2011 Takuma Award to Masato Shibuya
Tags: Advanced Lithography, fab, IC, JSAP, Levenson, litho, mask, OAI, OPC, PSM, RET, Shibuya, SMO, SRAF, Takuma
Posted in Equipment, fab, IC, Material, MEMS, Product, Service | Comments Off on JSAP 2011 Takuma Award to Masato Shibuya
Monday, March 21st, 2011
SPIE Advanced Lithography 2011 showed few new tools or techniques, but many new materials and integration tricks to extend 193i into double-patterning for IC HVM, while EUV and DSA developments continue according to expert Dr. M. David Levenson of BetaSights.
Advanced Lithography is All about Materials
Tags: 10nm, 16nm, 193i, 20nm, 22nm, a-Si, Advanced Lithography, ALD, alt-PSM, ArF, ASML, CAR, CDU, Cymer, DFM, Dow, DP, DPP, DR, DSA, EbDW, EDA, EUV, EUVL, GDR, Gigaphoton, IBM, IC, IMEC, Intel, LELE, LER, Levenson, litho, logic, LPP, LWR, materials, MEEF, Nikon, OPC, PAG, RDR, RET, RSADP, SADP, Samsung, SPIE, SRAM, TEL, TSMC, Xtreme
Posted in Equipment, fab, IC, Material, MEMS, Product, Service | Comments Off on Advanced Lithography is All about Materials
